Nitrous oxide, commonly known as laughing gas, is a colorless, odorless gas that has numerous industrial applications.
One of its primary uses is in the semiconductor, photovoltaic, and TFT-LCD fields.
In these fields, nitrous oxide is employed as a dilution gas (or balance gas) in the chemical vapor deposition process.
Chemical vapor deposition (CVD) is a technique used to deposit thin films of material onto a substrate.
In this process, reactive gases are introduced into a reaction chamber, where they react to form a thin film of the desired material on the substrate surface.
Nitrous oxide serves as a dilution gas in CVD because it has a high purity of 99.999%.
This high purity ensures that the film deposited on the substrate is free from impurities, which is crucial for the production of high-quality semiconductor ICs, photovoltaic cells, and TFT-LCDs.
Moreover, nitrous oxide is a strong oxidant, which means it can efficiently oxidize the other gases used in the CVD process.
This oxidation reaction helps to ensure that the film deposited on the substrate is stoichiometric, meaning it has the correct ratio of elements present.
Overall, nitrous oxide's combination of high purity and strong oxidizing properties makes it an excellent choice for use in the semiconductor, photovoltaic, and TFT-LCD fields as a dilution gas in the chemical vapor deposition process.
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